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  5. MAXstream® Remote Plasma Source
MAXstream® Remote Plasma Source
MAXstream® Remote Plasma Source
MAXstream® Remote Plasma Source
MAXstream® Remote Plasma Source

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MAXstream® Remote Plasma Source

Brand: AEI

Category: Remote Plasma Sources
  • Semiconductor applications
  • RF Plasma Generators

    • Rapid Ox Remote Plasma Source

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    Reliable, High-Performance Remote Plasma Source for Chamber Clean Applications
    The MAXstream RPS is available in multiple SLPM NF3 flow rates to optimize price and performance. It ensures long chamber life and low particle generation, and a unique dual ignition core design delivers best-in-class plasma ignition reliability. 


    .Key Features

    • MAXstream 300 (≤ 3 L) for low flow applications and MAXstream 1200 (≤ 12 L) for higher flow applications
    • Highly reliable RPS maximizes tool uptime
    • Enhanced cooling of plasma source walls to reduce damage from thermal expansion and chemical erosion
    • Active monitoring and control of plasma power for advanced power control

    Benefits

    • Optimize cost via multiple flow options
    • Save valuable tool space with a smaller footprint than Xstream RPS
    • Extremely reliable ignition with unique AE dual ignition cores
    • Increase chamber life with proprietary AE chamber design
    • Reduce cleaning time with up to 12 SLPM flow capabilities

    Specifications

    MAXstream® Remote Plasma Source:
    Cooling: Water
    Output Frequency (MHz, kHz): 400 kHz
    Input Voltage (V): 208 VAC
    Power Level (kW): 6 to 12 kW
    Rack Width: N/A, chamber mounted
    Communications Interface: RS-232, Analog, Ethernet, EtherCAT
    Process Applications: Chamber Clean, Reactive Etch, Reactive Deposition
    Chemical Compatibility: Ar, O2, H2, N2, F2, H2O, NF3, CxFy
    Flow Range: 12

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